I've recently read some posts on dealing with and flying an HLC packing Outrider (notably http://community.fantasyflightgames.com/index.php?/topic/121712-thinking-about-the-donut-hole/). The most recent "Scum and Villainy podcast by some guys at Team Covenant also spent a good deal of time explaining how excellent the HLC Outrider is going to be. Thinking about both of these, it seems to me that while the HLC Outrider is going to be really very good, it has a huge weakness in the form of Ion weaponry. Not only does is suffer from the normal movement and action related issues with ion weapons, it suffers hugely from having attacks denied when it's movement becomes predictable.
I think that both Ion Cannons (and Turrets) and Ion Pulse Missiles will have big effects on the Outrider, and I wanted to discuss them:
1.) Like any large ship, if it is threatened with Ionization, it has a much restricted movement profile, because it can't risk being ionized off the board. In general, the HLC Outrider suffers much more from predictable movement than any other ship, because it has an area of zero Attack, which corresponds to the area of bonus Attack for any other ship.
2.) If ionized, it will be much easier to get ships into the HLC dead zone, and like all ionized ships, it will be much easier to deny actions, which is particularly rough on a large ship with a built in barrel roll that needs to keep distance in order to attack.
Dash Rendar + HLC Outrider is a 48 point investment, barring other upgrades, that is about as tough as a Firespray. If you can ionize it and deny it an action, even only once (Ion Pulse Missiles), you've got a window where you can put a huge amount of damage on the Outrider. The commonly fielded Howlrunner/Miniswarm (3 Academy TIEs and Howlrunner) at Range 1 will do about 7 damage in one round. You couldn't really rely on that sort of thing happening without ionization, but with ionization it becomes a lot more likely.
Long story short, if you're having trouble with an HLC Outrider, bring some ion weapons.